Assoc. Prof. Dr Tso-Fu Mark Chang | Multiferroic materials | Best Researcher Award
Assocaite Professor, Institute of Science Tokyo, Japan
A distinguished materials scientist, currently an Associate Professor at the Institute of Integrated Research, Institute of Science Tokyo,. Holds a Doctor of Engineering from Tokyo Institute of Technology (2012). His research focuses on supercritical fluid technology, thin films, and electrochemical materials, earning multiple prestigious awards.
Profile
Education ๐๐
Doctor of Engineering (Materials Science & Engineering), Tokyo Institute of Technology, Japan (2012) ๐ | Master of Engineering, Tokyo Institute of Technology, Japan (2011) ๐ | Master of Chemical Engineering, National Tsing-Hua University, Taiwan (2007) ๐ | Bachelor of Applied Science & Engineering, University of Toronto, Canada (2004) ๐
Experience ๐ฌ๐ผ
Associate Professor, Institute of Integrated Research, Institute of Science Tokyo (2024present) ๐๏ธ | Associate Professor, Institute of Innovative Research, Tokyo Tech (20212024) ๐ | Assistant Professor, Tokyo Tech (20122021) ๐
| QA Engineer, DuPont, Taiwan (20082009) ๐ญ | Lab Assistant, ITRI, Taiwan (2005) ๐
Awards & Honors ๐๐๏ธ
Best Oral Presentation, Supergreen (2022) ๐ฅ | Konica Minolta Imaging Science Award (2022) ๐ | TACT Gold Award (2021) ๐ฅ | Multiple Best Paper & Poster Awards at TACT, MDPI, and MSAM ๐ | Young Researcher Award, Japan Institute of Metals (2014) ๐ | Over 25 prestigious awards in materials science and engineering ๐
Research Focus ๐งช
Expert in supercritical fluid technology, thin films, electrochemical materials, and MEMS ๐ญ | Develops advanced materials for sustainability and energy applications ๐ฑ๐ | Innovates in nano-fabrication, catalysis, and semiconductor processes ๐งโ๐ญ | Active in international collaborations and academic societies ๐๐ | Committee Member of Integrated MEMS Technology Research Group in JSAP (2017~present) ๐ฌ
Publicationsย
Mechanistic insights into photodegradation of organic dyes using heterostructure photocatalysts
Preparation of monolithic silica aerogel of low thermal conductivity by ambient pressure drying
Bright nickel film deposited by supercritical carbon dioxide emulsion using additive-free Watts bath
Conclusion:
The candidateโs exceptional research achievements, global recognition, and leadership in materials science make them a strong contender for the Best Researcher Award. Addressing industry collaboration and commercialization aspects could further enhance their candidacy.